Components and spare parts for ion implantation

Ion Implantation is an important process during the manufacture of semiconductors. Implanters dope wafers with "foreign atoms" in order to modify material properties such as conductivity or crystal structure. The heart of an implanter system is the beam path. Here, the ions are generated, concentrated, accelerated dramatically and guided at high speed to the wafer.

Temperatures of up to 1400°C, strong electromagnetic fields, aggressive process gases and powerful mechanical forces cause problems for conventional materials. Plansee's heat-resistant components made from molybdenum, tungsten, graphite or ceramics excel due their ideal combination of corrosion resistance, material strength, high thermal conductivity and absolute purity. 100 or more Plansee components are at work in every beam path. They ensure that the ions are generated efficiently and guided precisely and free from impurities along the beam path to the wafer.

Accurate to a thousandth of a millimeter and with more than 30 years of experience in the semiconductor industry, Plansee produces components that conform precisely to the OEM standard or further develop these components at production sites in Japan and the USA. Because, for customers in the semiconductor industry, Plansee spare parts are increasingly becoming more than just spares. Taking the equipment manufacturer's original spare parts as a starting point, Plansee optimizes the geometries and material compositions. The benefits are:

  • Simplified component installation and removal
  • Longer service lives
  • Lower cleaning costs
  • Reduced maintenance work
  • Reduced downtimes

Image provided by the courtesy of Plansee.