Molybdenum sputtering targets
Molybdenum coatings are the crucial components of the thin-film transistors used in TFT-LCD screens. These provide instantaneous control of the individual image dots (pixels) and consequently ensure particularly sharp image quality. Molybdenum layers are also used as back contacts in CIGS solar cells.
How to produce molybdenum thin films
In the magnetron sputtering method tiny metal particles are vaporized from the sputtering targets and are then deposited as a thin film on the glass substrate. In this fast, economical coating process, all the materials must meet the highest quality criteria.
Planar molybdenum targets
For more than 20 years, Plansee materials have proved their worth as thin films in TFT displays.
Extremely pure, Maximum density, Homogeneous microstructure
Single and multi-piece planar & rotary targets are available, which will be bonded in-house. Plansee produces sputtering targets for all commonly used systems as well as to specific customer needs.
There’s none cleaner
The most important benefits for the films: an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Because: Metallic and gaseous impurities in the sputtering target are reproduced almost 1:1 in the sputtered functional layer and result in particle formation during the PVD process (arcing effect). Plansee molybdenum targets have a guaranteed purity of at least 99.97%. The average purity of Plansee's targets lies at an unbeatable 99.99%.
The typical oxygen content is as low as 6 ppm. In this way, Plansee helps ensure that every pixel in the TFT-LCD display is precisely controlled and that the CIGS back contact functions perfectly.
Thanks to their special forming processes, Plansee's molybdenum sputtering targets have a density of almost 100%, leading to a faster process due to higher sputtering speeds. The denser the molybdenum target is, the better the conductivity of the created layer.