ULTEM FILM; Dielectric film UTF120

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Description

ULTEM™ polyetherimide (PEI) UTF120 film offers solutions for professional-grade dielectric film capacitors, meeting the most stringent technical demands. The film exhibits stable properties through a range of temperatures (-40 °C to +150 °C) and frequency, including stable capacitance, good insulation resistance, stable dielectric constant (Dk) and low dissipation factor (Df). ULTEM UTF120 film has been validated with both film-foil and metalized electrodes, including flat aluminium, heavy edge/light body and fused/patterned electrode designs. ULTEM UTF120 film offers excellent handling through metallization, winding and capacitor squashing / flattening. Additionally, capacitors using ULTEM UTF120 film are also capable of passing industry-standard 260 °C reflow soldering processes.

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Anwendungen

Elektronik

Anzeigegeräte

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Eigenschaften

Allgemein

Property	Temperature	Value	Comment
Dichte	23.0 °C	1.29 g/cm³ Show Supplier Material materials with Dichte of 1.29 g/cm³	ASTM D 792
Moisture absorption	23.0 °C	0.23 % Show Supplier Material materials with Moisture absorption of 0.23 %	ASTM D 570 \| (50% RH, Equilibrium)
Wasserabsorption	23.0 °C	1.16 % Show Supplier Material materials with Wasserabsorption of 1.16 %	ASTM D 570 \| (23°C/Saturated)

Technological properties

Property
Application areas	Electronic Material
Availability	Europe,Asia,MEA,Americas,Global
Supplier Disclaimer	While the information is provided in good faith, SABIC MAKES NO WARRANTY, EXPRESS OR IMPLIED, INCLUDING MERCHANTABILITY AND NONINFRINGEMENT OF INTELLECTUAL PROPERTY, NOR ASSUMES ANY LIABILITY, DIRECT OR INDIRECT, WITH RESPECT TO THE PERFORMANCE, SUITABILITY OR FITNESS FOR INTENDED USE OR PURPOSE OF THESE PRODUCTS IN ANY APPLICATION. Each Buyer must determine the suitability of SABIC's materials for the Buyer's particular use through appropriate testing and analysis. No statement by SABIC concerning a possible use of any product, service or design is intended, or should be construed, to grant any license under any patent or other intellectual property right.