SIGRAFINE® SiC Coating

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Description

SIGRAFINE SiC Coating is a dense, wear-resistant silicon carbide coating. It has high corrosion and heat resistance properties as well as excellent thermal conductivity. We apply SiC in thin layers onto the graphite using the chemical vapor deposition (CVD) process.


The coating improves product quality and increases process efficiency, thus reducing overall operating costs for our customers. This coating extends the service life of graphite components and achieves the high-purity surface structures required in processing semiconductor materials.


We supply SiC-coated products made from high-strength isostatic graphite and carbon fiber-reinforced carbon. These include components for fluidized-bed reactors and STC-TCS converters, as well as reflectors for CZ units and wafer carriers for PECVD, Si epitaxy, and MOCVD units.

Diese Materialdaten wurden von SGL Carbon zur Verfügung gestellt

Alle Daten beziehen sich auf Raumtemperatur soweit nicht anderweitig spezifiziert. SI Einheiten werden verwendt soweit nicht anderweitig spezifiziert.
Äquivalente Standards sind ähnlich zu einem oder mehreren Standards die der Anbieter angegeben hat. Manche äquivalente Standards können strikter sein oder außerhalb der Bedingungen des ursprünglichen Standards.

Ashby charts

Eigenschaften

Allgemein

PropertyValueComment

Oberflächenrauigkeit

2.5 μm

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Profilemeter

Schüttdichte

3.2 g/cm³

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XRD

Mechanisch

PropertyValueComment

Elastizitätsmodul

435 GPa

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Nanoindentation

Thermisch

PropertyValueComment

Koeffizient der thermischen Ausdehnung

4.2999999999999995e-06 1/K

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@100-600°C; Dilatometer

Optisch

PropertyValue

Orientierung in der optischen Ebene

111 preferred via XRD

Chemical properties

PropertyValueComment

Aluminium

4e-06 %

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max.

Antimon

1e-06 %

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max.

Arsen

5e-07 %

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max.

Bismut

1e-06 %

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max.

Blei

1e-06 %

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max.

Chrom

4.9999999999999996e-06 %

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Eisen

1e-06 %

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max.

Gallium

5e-06 %

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max.

Germanium

5e-06 %

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max.

Indium

1e-06 %

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Kalium

5e-06 %

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max.

Kalzium

4.9999999999999996e-06 %

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Kupfer

1e-06 %

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Magnesium

1e-06 %

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Mangan

5e-07 %

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Natrium

5e-06 %

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max.

Nickel

5e-07 %

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max.

Phosphor

1e-06 %

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max.

Schwefel

4e-06 %

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max.

Tellur

1e-06 %

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Titan

5e-07 %

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max.

Vanadium

1e-07 %

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Wolfram

1e-06 %

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Zink

5e-06 %

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Zinn

1e-06 %

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Technological properties

Property
Application areas

Coating for components for fluidized-bed reactors and STC-TCS converters, as well as reflectors for CZ units and wafer carriers for PECVD, Si epitaxy, and MOCVD units.

Processing methods

CVD