Propiedades
General
| Property | Value | Comment |
|---|---|---|
Densidad | 3.51 g/cm³ Show Supplier Material materials with Densidad of 3.51 g/cm³ | |
Rango de tamaño de partículas | 40 µm Show Supplier Material materials with Rango de tamaño de partículas of 40 µm | Please refer to the technological properties section below for more detailed (narrow) particle size ranges available. |
Mecánica
| Property | Value |
|---|---|
Dureza (en mohs) | 10 [-] Show Supplier Material materials with Dureza (en mohs) of 10 [-] |
Aplicaciones térmicas
| Property | Value |
|---|---|
Coeficiente de dilatación térmica | 1.1e-06 1/K Show Supplier Material materials with Coeficiente de dilatación térmica of 1.1e-06 1/K |
Conductividad térmica | 600 - 4000 W/(m·K) Show Supplier Material materials with Conductividad térmica of 600 - 4000 W/(m·K) |
Eléctrico
| Property | Value |
|---|---|
Banda prohibida | 6 eV Show Supplier Material materials with Banda prohibida of 6 eV |
Resistividad eléctrica | 1e+12 - 1e+19 Ω·m Show Supplier Material materials with Resistividad eléctrica of 1e+12 - 1e+19 Ω·m |
Óptico
| Property | Value |
|---|---|
Índice de refracción | 2 [-] Show Supplier Material materials with Índice de refracción of 2 [-] |
Chemical properties
| Property | Value | Comment |
|---|---|---|
Carbono | 99 % Show Supplier Material materials with Carbono of 99 % | min. purity |
Technological properties
| Property | ||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
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| Application areas | FG micron diamond powder is ideal for lapping applications requiring a high stock removal and a controlled surface finish. Typical applications include lapping and polishing of sapphire, synthetic gemstones, ceramics, tungsten carbide, soft and hard metals. | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||
| Color | Dark gray | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||
| Crystal structure | Polycrystalline | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||
| Gradings | Standard size range The standard size range makes this product suitable for applications that focus primarily on cost. The controlled upper-limit ensures a uniform, scratch-free surface quality. | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||
| Morphology | The micro-structured, rough particle surface provides numerous contact points between diamond particles and the work piece. This feature ensures high material removal rates even in processes with low specific pressure, such as polishing processes on soft cloths or pads. | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||
| Particle size range table |
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| Synthesis | Polycrystalline diamond is formed by detonation synthesis. The ultra-short synthesis time yields diamond particles with a polycrystalline structure. Each diamond particle consists of countless primary crystals of approximately twenty nanometers in size. The rough particle surface and the high particle strength of polycrystalline diamond are characteristic features of polycrystalline diamond synthesis. Proprietary shaping and cleaning processes guarantee a uniform, blocky particle shape and a controlled product purity. | |||||||||||||||||||||||||||||||||||||||||||||||||||||||||